研究成果 | 作为通讯作者或第一作者,近年在IEEE等高水平刊物发表学术论文如下: 1、Ge Y, Huang Z*, et al. 300–2200 nm Broadband Si Schottky Photodetectors With Ultra-Low Dark Current (<10 nA/cm2) via Al2O3/SiOx Interface Engineering. IEEE Journal of Lightwave Technology, 2025, 43, 8832. 2、Ge Y, Huang Z*, Yang M, et al. 532–2200 nm Si Schottky Photodetectors Featuring Nonuniform Barrier Layers. IEEE Transactions on Electron Devices, 2025,72, 3667. 3、Ke S, Wang J, Huang Z*, et al. Achievement of non-charge layer InGaAs/Si avalanche photodiodes by introducing a groove ring at the bonding interface. Physica Scripta, 2024, 99(5): 055006. 4、Jiang R, Chen F, Zheng Z, Ke S, Zhou J, Liu G, Huang Z*. Simulation and Analysis of Extinction Properties of Rh Nanostructures. Laser & Optoelectronics Progress, 2023, 60(19): 1925001. 5、Chen F, Jiang R, Zheng Z, Ke S, Zhou J, Liu G, Huang Z*. Simulation and Analysis of Infrared Extinction Characteristics of ITO Nanorod Structures. Acta Optica Sinica, 2023, 43(9): 0916002. 6、Huang Z, et al. High-performing silicon-based germanium Schottky photodetector with ITO transparent electrode. Chinese Physics B, 2021, 30(3): 037303. 7、Huang Z, Wang J, Huang W, et al. Research progress of technologies for germanium near-infrared photodetectors[J]. Infrared and Laser Engineering, 2020, 49(1): 0103004. 8、Huang Z, Yu C, Chang A, et al. High-k dielectric interlayered ITO/germanium Schottky photodiodes with low dark current and high photoconductive gain. Journal of Materials Science, 2020, 55(20): 8630-8641. 9、Yu C, Huang Z, et al. High-specific-detectivity, low-dark-current Ge nanowire metal–semiconductor–metal photodetectors fabricated by Ge condensation method. Journal of Physics D: Applied Physics 53.12: 125103 (2020). 10、Huang Z, Mao Y, Lin G,et al. Impacts of ITO interlayer thickness on metal/n-Ge contacts. Materials Science and Engineering: B, 2017, 224: 103-109. 11、Huang Z, Mao Y, Lin G,et al. Low dark current broadband 360-1650 nm ITO/Ag/n-Si Schottky photodetectors. Optics Express, 2018, 26(5): 5827-5834. 12、Huang Z, Mao Y, Chang A, et al. Low-dark-current, high-responsivity indium-doped tin oxide/Au/n-Ge Schottky photodetectors for broadband 800-1650 nm detection. Applied Physics Express, 2018, 11(10): 102203. 13、Huang Z, et al. Impacts of excimer laser annealing on Ge epilayer on Si. Appl. Phys. A 123:148(2017). 14、Huang Z, et al. Suppressing the formation of GeOx by doping Sn into Ge to modulate the Schottky barrier height of metal/n-Ge contact. Applied Physics Express 2016, 9, 021301. 近年主持的项目: 1、基于键合材料高性能ITO/Si基n-Ge肖特基光电探测器的研制,福建省自然科学基金,2023-2026。 2、近红外局域表面等离激元共振增强Ge肖特基光电探测器基础研究,2023-2025. 课题组团队拥有良好的科研氛围和实验条件。欢迎对半导体器件物理、微纳加工工艺、光电器件设计、新型材料应用充满热情,有志于在集成电路、光电子技术、半导体工艺领域深入钻研的优秀学子加入! |